- 5 - 1000 nanometer resolution (XX).
- Non-contacting, operating in reflection.
- Impervious to atmospheric or laser
wavelength changes.
- Impervious to off-axis translations.
- Very high alignment tolerances. No
mechanical adjustments.
- Two layers of spatial filtering for
contaminant rejection.
- Zero index available on MPE-CFZ.
- High accuracy scales available.
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MPE-CF-XX, MPE-CFZ-XX
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